Heidelberg Instruments: DWL 66-fs Maskless Lithography Laser Writer

 DWL 66-fs Maskless Lithographs Laser Writer

The DWL 66-fs is a high precision, direct write laser lithography system for:

  • Maskless lithography
  • Photomask making
  • Direct writing applications
  • Gray-scale exposures
  • Any flat material coated with a photosensitive layer

Main features include:

  • Minimum feature size: 0.6 microns
  • Substrate size: Up to 200 x 200 mm (8 x 8 inches)
  • Over 1.0M dpi using a 20-nanometer writeable address grid