The DWL 66 is a high precision, direct write laser lithography system for:
- Maskless lithography
- Photomask making
- Direct writing applications
- Gray-scale exposures
- Any flat material coated with a photosensitive layer
Main features include:
- Minimum feature size: 0.6 microns
- Substrate size: Up to 200 x 200 mm (8 x 8 inches)
- Over 1.0M dpi using a 20-nanometer writeable address grid