User are responsible for bringing nessary material for processing, eg. photoresist, development etc. Any material brought into cleanroom is subject to cleanroom manager for review.

Currently availble tools:

• Heidelberg DWL-66s laser writer
• JEOL JSM-7001F SEM and EBL XPG2 pattern generator
• Laurell WS-650 Mz spin coater
• Reactive Ion Etcher (dielectric material)
• HP61 hot plate
• Nikon optphot 66
• KLA-Tencor D300 Profiler
• UV Ozone cleaner
• West Bond Wire Bonder
• Nanomaster Dual Ebeam Evaporator
• J.A. Woolam Co., Inc. M-2000V Automated Angle Ellipsometer
• Oerlikon Sputtering & Ebeam system
• Trovato organic deposition
• Chemical processing station for photomask developing and liftoff