architectural rendering of cleanroom courtesy of HALFF Associates, Inc

The UNT Center for Microelectronics in Extreme Environments: Cleanroom is maintained by the University of North Texas to support the research needs of faculty and students from a broad range of engineering and science disciplines.   The cleanroom occupies approximately 2600 sq. ft. of clean space and includes 300 sq.ft a Class 100 lithography area and a Class 10,000 wet and dry processing and characterization area.  Initial capabilities will emphasize nano/micro device development, Photomask fabrication and thin film techniques.  Highlights of the tool list include:

• Electron Beam Lithography/Scanning Electron Microscope
• Ion Assist Electon Beam and Sputtering Combo Thin Film Deposition System
• KLA-Tenco Profiler
• Heidelberg DWL 66 Maskless Laser Lithography System
• Laurell chemical processing stations
• Reactive Ion Etchers (RIE)
• Trovato 12 source thermal evaporator with 4 material co-deposition

For a complete list of tools to be included and the layout of the facility , see the Tools and Instrument page and rates for cleanroom tools at Cleanroom User Fee Structure. Tool scheduling at UNT FOM.

For steps to become a cleanroom user, see the How to become a cleanroom user. Other user related information is under User Information.

The CMEE committee has approved Guidelines for Cleanroom Space Usage, April, 15 2024.

Updated cleanroom capacity examples!