Dual Ebeam Evaporator




Nano-Master, Inc. NEE-4000 Electron Beam Evaporation Systems come in a dual chamber configuration consisting of the main chamber where platen is located and a secondary chamber for housing the e-beam source. This configuration with a gate valve between two chambers may be used as a load lock to keep the e-beam source pockets in vacuum while substrate is loaded and unloaded from the main chamber substrate holder or platen.  On other applications where automatic loading and unloading of wafers is needed, it can be achieved through a third load lock chamber that may be attached to the left face of the cube. Co-evaporation capability with multiple e-beam sources and ability to program compositions or compositional gradients through PC control can be provided.